This study investigates the impact of different Atomic Layer Deposition techniques on the Ti-metalation of chitosan (CS) for biomedical applications. Three methods – vapour phase metalation (VPM), multiplied pulsed vapour phase infiltration (MPI), and O₂ Plasma Enhanced ALD (PEALD) – were employed using Tetrakis(dimethylamino)titanium as the precursor. X-ray photoelectron spectroscopy revealed varying degrees of titanium chemisorption and Ti–O bond formation, highlighting the role of water in in