The rapid development of photopolymerization technologies in cutting-edge fields such as microelectronics, additive manufacturing, and flexible electronics has created an urgent demand for advanced photoresins that combine exceptional mechanical strength with ultrahigh thermal stability. To address this challenge, we present a random allyl functionalization strategy to impart photoprocessability to polybenzimidazole (PBI). Starting from commercially available diacid and tetraamine monomers, we f